ECR Plasma System for Diamond and Diamond Like Material Coatings

Introduction

An ECR system for deposition of micro-crystalline diamond, diamond-like carbon (DLC), diamond-like nano composites, boron nitride, silicon nitride is available. The system is based on ECR plasma deposition using microwave power (2.45 GHz). The vacuum system, the power source and the coupling system is developed for deposition of substance on 4" diameter waters of silicon or other similar substrates. The system is upgradable for large area deposition on flat as well as complex surfaces.

Salient features

Thin film coatings of excellent uniformity over large area and engineering surfaces is possible

Prospective Users

All tool manufacturers, watch makers, decorative coating makers.

Type of Technology

Process

Glossary

CVD - chemical vapour deposition; ECR - electron cyclotron resonance; DLC - diamond-like carbon; BN - boron nitride

Developed by

Prof. D V Vankar

Department

Physics

For further information please contact

Managing Director
Foundation for Innovation and Technology Transfer (FITT)
Indian Institute of Technology, Delhi
Hauz Khas, New Delhi-110016, INDIA
Tel : 91-011-26597167, 26857762, 26581013, 26597153
Fax : 91-011-26851169
E-mail : drkdpn@gmail.com